Damage of multilayer optics with varying capping layers induced by focused extreme ultraviolet beam

摘要

Extreme ultraviolet Mo/Si multilayers protected by capping layers of different materials wereexposed to 13.5 nm plasma source radiation generated with a table-top laser to study the irradiationdamage mechanism. Morphology of single-shot damaged areas has been analyzed by means ofatomic force microscopy. Threshold fluences were evaluated for each type of sample in order todetermine the capability of the capping layer to protect the structure underneat